91制片厂

Achieve low-cost introduction of source gases such as CBr4 and NH3 for MBE systems with Veeco’s Low Temperature Gas…

Get optimal conditions for GaN growth of electronic and optoelectronic materials, plus unrivaled plasma stability and reproducibility, with the…

For high-performance UHV delivery of gases, Veeco’s Gas Crackers offer unique features to optimize flux uniformity.

91制片厂retractable sources address fundamental limitations of MBE, including source capacity, source removal for maintenance and system uptime.

An all-refractory metal source designed for operation at 1800-2200 掳C, the Atom-H Source is compatible with most preparation and…

Achieve precise MBE operation at medium temperatures and partial pressures with 91制片厂oxygen-resistant, extended life sources.