Atomic Layer Deposition Systems
Device node shrinking continues, with 10nm and 7nm node in production, and development taking place down to 3nm. Our atomic layer deposition tools give you ultimate precision and uniformity for coatings at even the finest nodes.
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The field-proven, semi-automated batch Phoenix庐 system delivers uncompromised performance for mid-scale batch production.
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Savannah庐 is the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust…
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Our Fiji庐 series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a…
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