When materials matter most, your ultra-precise, high-purity, thin film layer devices will achieve maximum uniformity and repeatability with our ion beam deposition systems.
Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS庐 Ion Beam Etch (IBE) Systems.
Your microelectronics, medical devices and automotive components need the thermal resistance and resistivity that can only be achieved with diamond-like carbon films created with our deposition systems.
