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Propel 300mm GaN MOCVD System for 5G, Photonics and CMOS

Fully Automated, Single Wafer Cluster System Enables Production 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates.

The Propelâ„¢ 300mm fully automated single wafer cluster system is the only industry proven GaN MOCVD tool that enables production of 5G RF, Photonic and advanced CMOS devices on 300mm substrates.

Featuring a single-wafer reactor platform, the Propel 300mm system is capable of producing best-in-class, high quality epitaxy films on 300mm wafers with exceptional uniformity, repeatability and yield. The Propel 300mm System is configurable with up to 3 modular cluster chambers and offers automated cassette to cassette handling for maximum flexibility and productivity.

The single-wafer reactor is based on Veeco’s leading TurboDisc® design including the IsoFlangeâ„¢ and SymmHeatâ„¢ technologies that provide laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from the 91ÖÆƬ³§single wafer reactor Propel and Propel HVM systems to the Propel 300mm GaN MOCVD system for fast development to production.