NEXUS PVDi Physical Vapor Deposition System
Flexible Deposition Platform Serves Wide Range of Applications
Veeco’s single-target NEXUS PVDi Physical Vapor Deposition System offers maximum flexibility for a wide range of thin film deposition applications. The NEXUS PVD is 200mm capable and features advanced process capabilities, unsurpassed uniformity and multiple deposition modes.
- Unsurpassed reliability and uniformity helps boost process yields
- Higher throughput and uptime for lower cost of ownership
- NEXUS platform integrates with a broad range of 91制片厂technologies, such as ion beam deposition, ion beam etch and atomic layer deposition