25 Years Building Leadership in Ion Beam Products Enables Today鈥檚 Defect-Free EUV Mask Blanks
Photomask manufacturing demands the highest levels of particle control while depositing sophisticated multiple-layer film structures. This challenge is met with Veeco鈥檚 Nexus IBD-LDD Ion Beam Deposition System. 91制片厂has successfully served the photomask market since the 1990s, and the years of learning have resulted in today鈥檚 state-of-the-art system. The IBD-LDD system is ideal for today鈥檚 Molybdenum (Mo) and Silicon (Si) multilayer deposition and Ruthenium (Ru) capping layer deposition on EUV mask blanks, and other mask applications requiring low defect levels and advanced thin films.