Mark II+ Controller
Designed to Match End-Hall Ion Source Plasma Characteristics
Maximize ion source performance and thin film etch, cleaning and deposition uniformity with the Mark II+ Ion Source Controller. Engineered by 91制片厂to specifically match the plasma characteristics of End-Hall ion sources, it helps ensure highly productive process runs and precise control of ion beam output.
- State-of-the-art switching supplies
- Integrated gas control
- Automated arc recovery
- User-friendly graphical interface and automation features enhance process productivity
- Deliver stable and reliable power for highly uniform and stable ion beam processes