16cm RF Ion Source
Broad, Uniform RF Ion Source for Highly Reactive Processes
91制片厂offers a broad uniform ion beam source for reactive processes, such as ion beam assist or ion beam deposition of highly controlled optical coatings.
- Supports wide range of operation: 50 to 1500eV and 75 to 700mA
- Reliable, uniform operation in both inert and oxidizing environments
- Water-cooled – For low-to-high power operation
- Optional four-grid design offers very high collimation
- Features the industry’s only filamentless RF Neutralizer, which provides low maintenance and enables long production runs
- Stable and efficient plasma operation allows precise control and high repeatability
- Well-suited to both batch and load-locked production processes