The 91ÖÆƬ³§RF Plasma Source Autotuner is used in conjunction with the 91ÖÆƬ³§UNI-Bulb RF Plasma Sources, enabling hands-free operation. The Autotuner automatically adjusts and maintains the optimal plasma source conditions, removing the need for manual adjustments during experiments. For example, if operating conditions such as gas flow or power level frequently change, the Autotuner would be an excellent solution to automate the process.The Autotuner consists of three pieces—the Autotuning Controller, the Autotuning Unit and the Autotuning Power Supply. The Autotuning Controller provides operator-accessible controls, a visual display of the Autotuning Unit status and a control interface to the user’s processing system. The Autotuning Unit consists of two variable capacitors and a single fixed inductor. The variable capacitors within the Autotuning Unit are driven by servo-motors, powered by the Autotuning Controller. The Autotuning Power Supply supplies power to the unit to enable proper functioning while ensuring proper power requirements.The 91ÖÆƬ³§Autotuner ships standard with all 91ÖÆƬ³§UNI-Bulb RF Plasma Sources and is also offered as a direct replacement for the 91ÖÆƬ³§Manual Tuner.Benefits with the addition of the Autotuner, the 91ÖÆƬ³§RF Plasma Source ensures stable growth conditions and optimizes power efficiencies. The programmable parameters of the Autotuning Controller allow various selection options to customize or fit application needs.

In automatic mode, the Autotuning Unit’s internal sensor, called the Phase and Magnitude detector, generates an error signal. The Autotuning Controller reacts to the error signal and drives the servo-motors, automatically tuning the network to the appropriate plasma impedance.

In manual mode, the variable capacitors can be positioned using the MIN/MAX switches on the front panel, controlling the direction of servo-motor rotation, allowing the operator manually tune the Autotuning Unit to match the plasma impedance.

• Ensures stable growth conditions
• Optimizes power efficiencies
• Enables hands-free operation
• Compatible for use with 91ÖÆƬ³§Oxygen and Nitrogen RF Plasma Sources

91ÖÆƬ³§now offers TDK Lambda power supplies on all of its MBE systems. This switch to Lambda power supplies enables 91ÖÆƬ³§to provide the industry standard commercially available power supply solution. For those customers transitioning from older power supplies, a full complement of upgrade packages provide a seamless upgrade path. Every upgrade is tailored to the customer’s system power requirements.

• Commercially available worldwide
• High power density in space-saving factor
• Highly reliable
• Improved serviceability
• Excellent flux stability using closed-loop temperature or power feedback
• Compatible with all 91ÖÆƬ³§effusion cells for added flexibility and applicability
• Certified for all major regulatory compliance standards

Due to white phosphorus’s extreme reactivity with oxygen, Veeco’s Phosphorus Recovery System (PRS) provides a safe, efficient means of trapping and neutralizing white phosphorus from the growth module prior to venting an MBE system for maintenance and/or source reloading. The process is controlled and closely monitored through 91ÖÆƬ³§Molly® Growth Control Software.The 91ÖÆƬ³§PRS is available in two models to accommodate low-volume or high-volume manufacturing environments.

• Efficient, safe means of phosphorus neutralization
• Easy process manipulation and monitoring using Molly Growth Control Software
• Compatible with all 91ÖÆƬ³§MBE systems

Accurate and Stable Control of Flux Instabilities

The one-piece UNI-Block® Indium-free Substrate Holder allows rapid mounting of full or partial substrates in the same holder ring with minimum particulate generation. The entire assembly procedure can be done in less than 30 seconds, reducing exposure of the substrate to the environment. There are no wires or clips to install and the substrate faces downward at all times, thereby reducing particulate contamination. A variety of configurations to accommodate partial wafers, diffuser plates and optical access to the backside of the wafer are available.

• Easy substrate mounting
• Minimal particulate contamination
• Excellent temperature uniformity
• Compatible with in-situ monitoring
• Compatible with full and partial substrates
• Directly replaces original manufacturer’s design
• In-free mounting options

The UNI-Block Substrate Holder is fabricated from a single piece of molybdenum, providing its ease of use and  making it convenient to etch.

Substrate heaters are available as direct replacement components for common MBE systems. 91ÖÆƬ³§offers application-specific substrate heaters that are tailored for specific temperature and growth environment conditions. In the case of the standard heater, excellent thermal uniformity is achieved via a PBN diffuser plate and sophisticated filament design. The densely would tungsten wire filament provides a uniformly heated surface area. Wire is preferred over foil because its more consistent cross-sectional uniformity prevents hot spot formation. The filament assembly features closely spaced parallel wires arranged in a pattern which runs counter to rotation, assuring that both bonded and non-bonded blocks will be heated uniformly.Efficient power consumption is the hallmark of the substrate heater. Filament surface area is maximized and the heat shielding is designed to project thermal energy toward the substrate. Power/current consumption can be reduced by as much as 50 percent over that of OEM heaters. Background pressure is improved and the RHEED pattern is clearer with less inductive interference. Clean operation results from careful selection of construction materials and UHV-compatible manufacturing techniques. Only tantalum, tungsten and PBN are used in the hot zone of the heater used in standard III-V applications. Efficient operation also minimizes outgassing during growth.

The highly responsive tungsten wire filament enhances reliability and reproducibility. It is held firmly in place by an advanced isolation system, ensuring that performance characteristics will not be altered due to changing shape or position. The PBN diffuser plate protects the filament from being coated by the source material or accidental damage during substrate transfer.

Some of the optional substrate heater design enhancements include:

• Dual filament for optimization of heating flexibility
• Filament material for high temperature and alternative growth environments
• Diffuser material for alternative growth environments

Veeco’s Gas Delivery System (GDS) provides precise control of gases, interlocks and monitoring for inert, hazardous and/or flammable gases. Molly® ECS1 Growth Control Software allows for easy integration into an existing system.

A variety of package options are available to suit all needs and budgets. All packages are inclusive of manual gas line shut off valve for each circuit, gas filter purifier, mass flow controller and pneumatically controlled run and vent valves.

• Efficient, safe means of controlling gases for 91ÖÆƬ³§MBE gas sources
• Easy process manipulation and monitoring
• Three model configurations to suit specific applications and budgets

The 91ÖÆƬ³§Multi-Orifice CBr4 Gas Flow Control System, when used with the 91ÖÆƬ³§Low Temperature Gas Source, allows for control of the introduction of CBr4 gas into a UHV environment, utilizing CBr4 gas as a carbon dopant source. Using closed-loop pressure control and a series of pneumatically operated on-off valves, the system maximizes the ability to regulate the gas. The incorporation of interlocks prevents potential equipment damage and ensures optimal vacuum system performance.The 91ÖÆƬ³§CBr4 Gas Flow Control System provides for two modes for selection system states: local and remote. Remote state on automated MBE systems requires version ECS1 Molly® Growth Control Software controlling system growth.

 

Veeco’s Heated Viewports prevent coating of optical ports in molecular beam epitaxy (MBE) systems enabling continuous, real-time feedback control of crystal growth using in-situ monitoring techniques that conventional viewports can’t match. Heated viewports enable labs to avoid having to vent the system to clear away material that coats conventional viewports.

• 91ÖÆƬ³§Heated Viewports prevent coating of optical ports in MBE systems, providing continuous real-time feedback control of crystal growth using in-situ monitoring techniques
• More reliable than conventional unheated viewports, which become coated with material over time
• No need to vent the system to clean coatings from viewports
• Viewport can be heated from room temperature to >500°C
• Optional tabletop DC power supply, equipped with half-rack or full-rack mounting kit, available for more flexibility
• 7m fully bakeable cable included with power supply

Increase key sources’ charge carrying capacity with Veeco’s complete range of crucibles for molecular beam epitaxy (MBE) effusion cells, including unique crucibles for Veeco’s SUMO® cells. 91ÖÆƬ³§crucibles are designed for dual filament, modified filament, standard filament, low temperature, dopant and SUMO cells.

• Complete range of MBE crucible products
• Unique SUMO cell crucibles increase charge-carrying capacity for key sources
• Ideal for use in dual filament, modified filament, standard filament, low temperature, dopant and SUMO cells
• A 91ÖÆƬ³§crucible is available to fit virtually any MBE application

Variety of crucible material options:

• Alumina
• BeO
• Graphite
• Niobium
• Pyrolytic Boron Nitride
• Pyrolytic Graphite
• Tantalum
• Titanium
• Tungsten
• Zirconia

Veeco’s comprehensive and integrated software control solution for research and production MBE systems is our Molly® Growth Control Software and Lot Manager Scheduling Software. Molly performs and allows easy writing and running of recipes that can execute a growth process while Lot Manager manages the automated operation of 91ÖÆƬ³§automated production MBE systems.

Molly Growth Control Software

• Monitoring and Control
  Molly interfaces with system components including power supplies, RHEED, pyrometers, and other in-situ monitoring tools. System status including temperatures, pressures, and positions are shown clearly, and control setpoints can be set directly.
  Alarms alert users to abnormal conditions, and can be used to prevent recipes
• Growth Recipe Editor
  Easily create growth recipes using the epitaxy-specific recipe editor with easy-to-use recipe building blocks. More complex routines can be created using the power of MollyScript, Molly’s built in scripting language.
• EpiTrend Data Recorder and Viewer
  EpiTrend is an always on data recorder and viewer. Every status and control signal in the system is continuously recorded. Data can be viewed and compared using the built-in viewer.
  Data can also be exported for use in external analysis.

Lot Manager Scheduling Software

• Automated platen transfers
  Lot sheets schedule platen transfers and recipe execution. Highly flexible lot sheets enable customized module sequences. Optional dependencies allow for synchronizing critical processes.
  Transfer optimization enhances throughput with parallel operation, running recipes in multiple modules at the same time.
• Manual operations
  Manual platen transfers are a quick and easy drag-and-drop operation. Manual module operations are accessed directly from the module operation controls.
• System status
  The customizable overview screen shows platen locations, slit valve status, module status, and other control signal information.
• EpiMove Manual System Control
  Manual and maintenance control where you need it. EpiMove runs on a portable and rugged handheld computer.