Veeco’s NOVUS RF lon Source Controller features a state-of-the-art precision control system design, providing reliable and stable power for ion source operation in all types of processes. Power modules, improved RFN operation and integrated gas flow control with ratio capabilities allow for optimal ion source control and performance in the most demanding process environments.

• Exceptional process stability with advanced beam control algorithms
• Hassle-free neutralizer operation with variable frequency technology
• Superior durability through sophisticated fault-handling circuitry
• Customizable control settings for tailored source operation

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Veeco’s 6 x 22cm gridded linear RF ion source is designed for highly productive in-line systems with pallets of substrates, large substrates or large arrays of small substrates. It is designed for high availability, low maintenance operation and is ideal for processes using 100 percent argon, oxygen or other reactive gases.

• Provides the proper current densities and uniformities for pre-clean, etch and ion beam assisted deposition (IBAD) applications
• Well-suited for low maintenance, long uninterrupted production runs
• Reliable, uniform operation in both inert and oxidizing environments
• Low to moderate power operation
• Stable and efficient plasma operation allows precise control and high repeatability

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Ideal for uniform processing of large-scale substrates, Veeco’s 6 x 66cm RF linear ion source provides low-maintenance, filamentless operation on 100 percent argon, oxygen and other reactive gases for long uninterrupted production runs.

• Provides the proper current densities and uniformities for pre-clean, etch and ion beam assisted deposition (IBAD) applications
• Water-cooled
• Reliable, uniform operation in both inert and oxidizing environments
• Low-to-high power operation
• Industry’s only filamentless RF Neutralizer enables longer production runs
• Optional four-grid design offers very high collimation
• Stable and efficient plasma operation allows precise control and high repeatability

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91制片厂announces the 16cm RF High Power (HP) ion source, with beam uniformity of <10% across 120cm. It is ideal for use in reactive processes such as ion assisted e-beam (IAD) or sputter deposition processes.

• Supports wide range of high power peration: 200 to 1500eV and 200 to >1000mA
• Reliable, uniform operation in both inert and oxidizing environments
• Increased power and current uniformity facilitates improved packing densities and increased oxidation rates
• Also enhances stoichiometry control and helps create smoother films
• Wide variety of grid sets available – Multiple interface packages facilitate easy upgrade path for existing IAD systems
• For sputter deposition, offers substantial deposition rate increases
• Ensures high thin film quality and stable process operation

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Improve the performance and quality of long uninterrupted reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings, with the 91制片厂12cm RF Ion Source. It features the industry’s only filamentless RF Neutralizer, which provides low maintenance and enables long production runs. The 12cm RF Ion Source is ideal for processes using 100 percent argon, oxygen or other reactive gases.

• Supports wide range of operation: 50 to 1500eV and 50 to 500mA
• Reliable, uniform operation in both inert and oxidizing environments
• Water-cooled – Low to moderate power operation
• Stable and efficient plasma operation allows precise control and high repeatability
• Well-suited to both batch and load-locked production processes

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