Etch Systems - Veeco /technologies-and-products/ion-beam-etch/ Thu, 11 Mar 2021 15:50:38 +0000 en-US hourly 1 https://wordpress.org/?v=6.5.3 https://veeco-media-file.s3.amazonaws.com/wp-content/uploads/2020/08/04073652/veeco-favicon.png Etch Systems - Veeco /technologies-and-products/ion-beam-etch/ 32 32 NEXUS IBE Ion Beam Etch System /products/nexus-420si-ibe-ion-beam-etch-system/ Mon, 30 Mar 2020 05:35:20 +0000 http://miriveeco.com/?post_type=products&p=1044 Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System.

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Unsurpassed Uniformity over Multiple Energy and Process Angles

Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System. The IBE System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing.

  • Superior uniformity and improved etch depth control
  • Highest throughput and reduced footprint for lowest cost of ownership
  • Easily integrates with common technologies on world-class NEXUS hardware and software platform
  • NEXUS Ion Source improves etch uniformity and process repeatability
  • Also available with RF350 source for operations that have process-qualified use of RF350 source
  • Platform can be cost-effectively field-upgraded to NEXUS Ion Source

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]]> Lancer Ion Beam Etch System /products/lancer-ion-beam-etch-system-2/ Sun, 29 Mar 2020 11:56:13 +0000 http://miriveeco.com/?post_type=products&p=837 Stand-alone ion beam etch system with low cost of ownership and highest quality etch attributes

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]]> The 91ÖÆƬ³§Ion Beam Etch Advantage


Ion beam etching is a proven technology for enabling the fabrication of advanced thin film devices in a high volume production environment. However, both R&D and pilot line production environments continue to innovate next generation MEMS, magnetic sensors and data storage devices that also rely on high performing etch systems with best-in-industry performance specifications. 91ÖÆƬ³§currently has over 300 installed ion beam etch systems worldwide supporting thin film device applications.

The New Lancer IBE System

The new Lancer™ Ion Beam Etch (IBE) System was designed for the development and production of next generation electronic devices found in smartphones, self-driving automobiles and other ‘internet-of-things’ devices that enable connectivity, functionality and mobility.

The Lancer system provides superior device quality attainable in R&D and production environments with:

  • Best-in-class system performance and capabilities
  • Single module configuration with reduction in footprint compared to previous IBE generations
  • Production-proven technology with large install base in use today
  • Large applications database with dedicated process and technical expertise
  • 91ÖÆƬ³§sales and service support infrastructure ensuring world class customer satisfaction

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