The 91��Ƭ��High Temperature Source provides thermal evaporation of charge materials at temperatures up to 2000°C. This compact MBE source operates efficiently to achieve high temperatures without excessive thermal load on the system. Low power requirements also enhance the lifetime of the heater filaments.

• For temperatures up to 2000°C in UHV
• Sources available for multi-wafer 4” systems
• Oxidation-resistant source construction
• User replaceable heat shielding and filaments
• More than 425 sources in the field

The hot zone is constructed exclusively of refractory tungsten and tantalum to ensure clean operation in UHV, even at the highest operating temperatures. The tungsten heater filaments, as well as the heat shielding at the orifice, are field replaceable. Insulating ceramics such as PBN are restricted to cooler regions of the source to prevent outgassing during operation.

• 6cc and 10cc straight-wall. Best suited for use with small (2”) substrates and partial wafers
• 24cc conical. Charge capacity and flux uniformity suitable for deposition on 3” and larger substrates
• 26cc SUMO. As with all SUMO crucibles, this source offers the largest available capacity, excellent flux uniformity, long-term flux stability, and efficient source operation for deposition on 3” and larger substrates
• 78cc conical. Largest capacity for deposition on multi-4” or single-8” systems

Crucibles are available in refractory metal and ceramic materials. The appropriate choice will vary with the desired evaporant material. Reactive materials are often evaporated from a metal crucible combined with a ceramic liner. The SUMO design is not available in all crucible materials due to manufacturing constraints.

Veeco’s retractable sources address fundamental limitations of MBE, including source capacity, source removal for maintenance and system uptime. The retractable source allows an individual source to be withdrawn and isolated from the growth environment with the source gate valve and then removed without venting the entire chamber. The source can then be easily refilled with the same material or a new material before being remounted at standard positions to the growth module, allowing growths to continue with minimal interruption. This saves the user from re-qualifying new source to substrate distances and multiple weeks of downtime by avoiding the process of an entire system vent and bake. In addition, the differential pumping option provides a marked improvement in base pressure around the source to reduce contamination of the source material and provide longer lifetimes for sources in corrosive and oxidizing environments. Veeco’s retractable source is the leading solution for material flexibility, system productivity and enhances our leadership with the patented SUMO source technology.

• Provides virtually uninterrupted system operation
• Reduces refill and maintenance times
• Improves reliability and bellows-free design
• Preserves purity of source material via differential pumping
• Available exclusively on 91��Ƭ��MBE systems