Deposit dense, uniform and repeatable thin diamond-like carbon (DLC) films for longer lasting TFMH slider overcoats and landing pads with Veeco’s NEXUS DLC-X System. The Nexus DLC-X features the industry’s first production-worthy Pulsed Filtered Cathode Arc Source to enable sub-20A overcoat thickness and supports improved step coverage for better process yield compared to previous generations.

• Exceptional uniformity, repeatability and film hardness from pulsed filtered cathodic arc
• Long throw, low pressure PVD provides dense, pin-hole free silicon seed layer
• Reactive PVD process capable
• Tunable low energy NEXUS 420 ion beam etch source results in stable operation down from 75 volt to 300 volt beam energies
• Tilting ellipsometer facilitates etch and deposition end point control

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